3 Inch Photomask

Zhixing, a professional manufacturer, would like to provide you high quality 3 Inch Photomask.

3 Inch Photomask is a very important component in machine vision, it can perform local processing or filtering operations on the image in the process of image processing, so that the quality of the image can be better improved and optimized. 3 Inch Photomask can be used to identify the edges in the image, emphasize the outline and features of the image object, which has an important role in many application scenarios.

For example, in image recognition, the mask version can smooth the noise and details in the image through operations such as Gaussian blur, so as to make the image clearer and brighter, which is more conducive to the recognition and classification of the target object. In the field of medical image analysis, 3 Inch Photomask can be used to locate and label diseased areas, helping doctors diagnose and treat related diseases more accurately.

In addition, the mask version can also be used in high-tech applications such as robot vision and automatic driving, through the segmentation and screening of images, so as to achieve rapid response and adaptation to the environment and road conditions, and improve the intelligence level and competitiveness of related products. Therefore, the role of mask in the machine vision industry is very indispensable.

In short, 3 Inch Photomask is a very important component in machine vision, which can locally process and optimize images, and has a very wide range of application scenarios and functions. We believe that in the continuous technological innovation and practice, the importance and role of mask in the machine vision industry will continue to increase.

Feature:

Only some products are shown in the table, if you need other products, you can consult customer service

Physical display of quartz glass photomask lithography products

The 3 Inch Photomask graphic data is designed and submitted by the user, and the subsequent processing technology is completed by the engineer. Since graphic data preparation is a key step in mask processing, users are required to check the submitted layout files carefully to ensure the correctness of the graphics.

crafting process:

(1) Draw a mask reticle layout file (GDS format) that can be recognized by the generation device

2) Use a maskless lithography machine to read the layout file, perform non-contact exposure (exposure wavelength 405nm) on the blank reticle with glue, and illuminate the required pattern area on the  reticle to make the photoresist in this area. (usually positive glue) undergoes a photochemical reaction

3) After developing and fixing, the photoresist in the exposed area dissolves and falls off, exposing the underlying chromium layer

4) Use chromium etching solution for wet etching, etch the exposed chromium layer to form a light-transmitting area, and the chromium layer protected by the photoresist will not be etched, forming an opaque area. In this way, plane pattern structures with different light transmittances are formed on the  reticle.

5) If necessary, use wet or dry methods to remove the photoresist layer on the  reticle, and clean the reticle.

Exhibition photos