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Photomask (Photomask), also known as photomask, photomask, lithography mask, etc., is a graphic master used in the lithography process in microelectronics manufacturing. The mask version achieves mass production by transferring the designer's circuit pattern to the substrate or wafer in the downstream industry by means of exposure. It plays a vital role in the manufacturing process of flat panel display, semiconductor, touch control, circuit board and other industries.

Optical wire gauge is a kind of high precision measuring tool, which is widely used in machine tools, grinding machines, milling machines, welding machines and other equipment for length measurement and positioning. This paper will introduce the use method of optical wire rule in detail, including its basic principle, calibration steps, operation steps and precautions.

As a precision measuring tool, optical wire gauge plays a vital role in modern industry and science and technology. It combines moire fringe of grating and photoelectric conversion technology to provide a linear measurement benchmark with high accuracy, high stability and high reliability. This paper will introduce the principle, type, application, maintenance and calibration methods of optical wire gauge in detail.

Computer-Generated Holography (CGH) is a technique that generates a user-defined wave front through computer-generated holograms and optical reconstruction. This technique has been widely studied and applied in the field of information optics since it was proposed by German scientist Roman in the late 1960s. Computational holography can not only record the intensity of information, but also record its phase, which makes it have a wide range of applications in 3D display, optical information storage and processing, entertainment and encryption.